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1

[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Advanced CMOS Technology beyond 45nm Node

Kawanaka, Shigeru, Hokazono, Akira, Yasutake, Nobuaki, Tatsumura, Kosuke, Koyama, Masato, Toyoshima, Yoshiaki

Year:

2007

Language:

english

File:

PDF, 4.56 MB

english, 2007

2

A high performance pMOSFET with two-step recessed SiGe-S/D structure for 32 nm node and beyond

Nobuaki Yasutake, Atsushi Azuma, Tatsuya Ishida, Kazuya Ohuchi, Nobutoshi Aoki, Naoki Kusunoki, Shinji Mori, Ichiro Mizushima, Tetsu Morooka, Shigeru Kawanaka, Yoshiaki Toyoshima

Journal:

Solid-State Electronics

Year:

2007

Language:

english

File:

PDF, 1.47 MB

english, 2007

3

In situ diagnosis of a-Si:H—metal interface reactions using IR spectroscopic reflectometry

Yasutake Toyoshima

Journal:

Thin Solid Films

Year:

1993

Language:

english

File:

PDF, 360 KB

english, 1993

4

A study on aggressive proximity of embedded SiGe with comprehensive source drain extension engineering for 32 nm node high-performance pMOSFET technology

Hiroki Okamoto, Nobuaki Yasutake, Naoki Kusunoki, Kanna Adachi, Hiroshi Itokawa, Kiyotaka Miyano, Tatsuya Ishida, Akira Hokazono, Shigeru Kawanaka, Ichiro Mizushima, Atsushi Azuma, Yoshiaki Toyoshima

Journal:

Solid-State Electronics

Year:

2009

Language:

english

File:

PDF, 651 KB

english, 2009

5

[IEEE ESSDERC 2008 - 38th European Solid-State Device Research Conference - Edinburgh, UK (2008.09.15-2008.09.19)] ESSDERC 2008 - 38th European Solid-State Device Research Conference - A Study on aggressive proximity of embedded SiGe with comprehensive SDE engineering for 32 nm-node high-performance pMOSFET technology

Okamoto, H., Yasutake, N., Kusunoki, N., Adachi, K., Itokawa, H., Miyano, K., Ishida, T., Hokazono, A., Kawanaka, S., Mizushima, I., Azuma, A., Toyoshima, Y.

Year:

2008

Language:

english

File:

PDF, 548 KB

english, 2008

6

Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition

Liu, Haiping, Jung, Sughoan, Fujimura, Yukihiro, Toyoshima, Yasutake, Shirai, Hajime

Journal:

Japanese Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 175 KB

english, 2001

7

Photochemical vapor deposition of hydrogenated amorphous silicon films from disilane and trisilane using a low pressure mercury lamp

Kumata, Ken, Itoh, Uichi, Toyoshima, Yasutake, Tanaka, Naoki, Anzai, Hiroyuki, Matsuda, Akihisa

Journal:

Applied Physics Letters

Year:

1986

Language:

english

File:

PDF, 515 KB

english, 1986

8

In situ characterization of the growing a-Si:H surface by IR spectroscopy

Yasutake Toyoshima, Kazuo Arai, Akihisa Matsuda, Kazunobu Tanaka

Journal:

Journal of Non-Crystalline Solids

Year:

1991

Language:

english

File:

PDF, 400 KB

english, 1991

9

Neutron Reflectometry of Buried Monatomic Hydrogen Layer at the Hetero-Interface in a Highly Mismatched Sr and H-terminated Si(111)

YAMAZAKI, Tatsuya, YAMAZAKI, Dai, ASAOKA, Hidehito, TAGUCHI, Tomitsugu, SHAMOTO, Shinichi, TOYOSHIMA, Yasutake

Journal:

Year:

2010

File:

PDF, 751 KB

2010

10

Behavior of surface hydrogen on a-Ge:H

Yasutake Toyoshima, Akihisa Matsuda, Kazuo Arai

Journal:

Journal of Non-Crystalline Solids

Year:

1996

Language:

english

File:

PDF, 255 KB

english, 1996

11

Lattice orientation of microcrystallites in μc-Si:H

Yasutake Toyoshima, Kazuo Arai, Akihisa Matsuda

Journal:

Journal of Non-Crystalline Solids

Year:

1989

Language:

english

File:

PDF, 198 KB

english, 1989

12

Absorption spectra of SiCl4, Si2Cl6, SiF3CH3 and GeF4 in the VUV region

Toshio Ibuki, Nobuaki Washida, Uichi Itoh, Yasutake Toyoshima, Hideo Onuki

Journal:

Chemical Physics Letters

Year:

1987

Language:

english

File:

PDF, 364 KB

english, 1987

13

Hydrogenated amorphous silicon prepared by ArF and F2 excimer laser-induced photochemical vapor deposition

Toyoshima, Yasutake, Kumata, Ken, Itoh, Uichi, Matsuda, Akihisa

Journal:

Applied Physics Letters

Year:

1987

Language:

english

File:

PDF, 589 KB

english, 1987

14

Substrate dependence of initial growth of microcrystalline silicon in plasma-enhanced chemical vapor deposition

Kondo, Michio, Toyoshima, Yasutake, Matsuda, Akihisa, Ikuta, Kazuyuki

Journal:

Journal of Applied Physics

Year:

1996

Language:

english

File:

PDF, 390 KB

english, 1996

15

Direct formation of crystalline silicon films on an amorphous substrate from chlorinated materials by plasma-enhanced chemical vapor deposition

Hajime Shirai, Sughoan Jung, Yukihiro Fujimura, Yasutake Toyoshima

Journal:

Journal of Non-Crystalline Solids

Year:

2002

Language:

english

File:

PDF, 511 KB

english, 2002

16

Nucleation Mechanism of Microcrystalline Silicon Studied by Real Time Spectroscopic Ellipsometry and Infrared Spectroscopy

Fujiwara, Hiroyuki, Toyoshima, Yasutake, Kondo, Michio, Matsuda, Akihisa

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 1.21 MB

english, 2000

17

Food Intake and the Risk of Endometrial Endometrioid Adenocarcinoma in Japanese Women

Takayama, Shin, Monma, Yasutake, Tsubota-Utsugi, Megumi, Nagase, Satoru, Tsubono, Yoshitaka, Numata, Takehiro, Toyoshima, Masafumi, Utsunomiya, Hiroki, Sugawara, Junichi, Yaegashi, Nobuo

Journal:

Nutrition and Cancer

Year:

2013

Language:

english

File:

PDF, 114 KB

english, 2013

18

In Situ Ultraviolet Laser Treatment during Plasma Deposition for the Improvement of Film Qualities in Hydrogenated Amorphous Silicon

Suzuki, Atsushi, Toyoshima, Yasutake, Mcelheny, Peter J., Matsuda, Akihisa

Journal:

Japanese Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 189 KB

english, 1991

19

Reply to “Comment on ‘Simulation of current–voltage curves for inverted structure perovskite solar cells using equivalent circuit model with inductance’ ”

Cojocaru, Ludmila, Uchida, Satoshi, Jayaweera, Piyankarage V. V., Kaneko, Shoji, Toyoshima, Yasutake, Nakazaki, Jotaro, Kubo, Takaya, Segawa, Hiroshi

Journal:

Applied Physics Express

Year:

2017

Language:

english

File:

PDF, 721 KB

english, 2017

20

Origin of Pseudo Second Order Reaction in a-Si:H Growth

Toyoshima, Yasutake

Journal:

e-Journal of Surface Science and Nanotechnology

Year:

2017

Language:

english

File:

PDF, 92 KB

english, 2017

21

Real-time detection of higher hydrides on the growing surface of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy

Toyoshima, Yasutake, Arai, Kazuo, Matsuda, Akihisa, Tanaka, Kazunobu

Journal:

Applied Physics Letters

Year:

1990

Language:

english

File:

PDF, 654 KB

english, 1990

22

Effect of Relative Humidity on Current-Voltage Characteristics of Li-Doped CuO/ZnO Junction

Toyoshima, Yasutake, Miyayama, Masaru, Yanagida, Hiroaki, Koumoto, Kunihito

Journal:

Japanese Journal of Applied Physics

Year:

1983

Language:

english

File:

PDF, 299 KB

english, 1983

23

Low-temperature growth of crystalline silicon on a chlorine-terminated surface

Guo, Lihui, Toyoshima, Yasutake, Kondo, Michio, Matsuda, Akihisa

Journal:

Applied Physics Letters

Year:

1999

Language:

english

File:

PDF, 240 KB

english, 1999

24

Low Temperature Deposition of Si-based Thin Films on Plastic Films Using Pulsed-Discharge PECVD under Near Atmospheric Pressure

Matsumoto, Mitsutaka, Inayoshi, Yohei, Suemitsu, Maki, Nakajima, Setsuo, Uehara, Tsuyoshi, Toyoshima, Yasutake

Journal:

MRS Proceedings

Year:

2008

Language:

english

File:

PDF, 2.40 MB

english, 2008

25

Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure

Kitabatake, Hirotatsu, Suemitsu, Maki, Kitahata, Hiroya, Nakajima, Setsuo, Uehara, Tsuyoshi, Toyoshima, Yasutake

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 390 KB

english, 2005

26

Simulation of current–voltage curves for inverted planar structure perovskite solar cells using equivalent circuit model with inductance

Cojocaru, Ludmila, Uchida, Satoshi, Jayaweera, Piyankarage V. V., Kaneko, Shoji, Toyoshima, Yasutake, Nakazaki, Jotaro, Kubo, Takaya, Segawa, Hiroshi

Journal:

Applied Physics Express

Year:

2017

Language:

english

File:

PDF, 671 KB

english, 2017

27

Neutron Reflectometry of Buried Monatomic Hydrogen Layer at the Hetero-Interface in a Highly Mismatched Sr and H-terminated Si(111)

YAMAZAKI, Tatsuya, YAMAZAKI, Dai, ASAOKA, Hidehito, TAGUCHI, Tomitsugu, SHAMOTO, Shinichi, TOYOSHIMA, Yasutake

Journal:

Year:

2010

File:

PDF, 751 KB

2010

28

Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition

Yali Li, Yoshie Ikeda, Yasutake Toyoshima, Hajime Shirai

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 270 KB

english, 2006

29

STM and Raman study of the evolution of the surface morphology in μc-Si:H

Kazuyuki Ikuta, Yasutake Toyoshima, Satoshi Yamasaki, Akihisa Matsuda, Kazunobu Tanaka

Journal:

Journal of Non-Crystalline Solids

Year:

1996

Language:

english

File:

PDF, 404 KB

english, 1996

30

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

Liu, Haiping, Jung, Sughoan, Fujimura, Yukihiro, Fukai, Chisato, Shirai, Hajime, Toyoshima, Yasutake

Journal:

Japanese Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 592 KB

english, 2001

31

Silicon Thin Film Growth by Pulsed Plasma CVD under Near-Atmospheric Pressure

Kitabatake, Hirotatsu, Suemitsu, Maki, Nakajima, Setsuo, Uehara, Tsuyoshi, Toyoshima, Yasutake

Journal:

MRS Proceedings

Year:

2005

Language:

english

File:

PDF, 253 KB

english, 2005

32

In-situ investigation of the growing a-Si:D surface by infrared reflection absorption spectroscopy

Yasutake Toyoshima, Akihisa Matsuda, Kazuo Arai

Journal:

Journal of Non-Crystalline Solids

Year:

1993

Language:

english

File:

PDF, 341 KB

english, 1993

33

Real time in situ observation of the film growth of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy

Toyoshima, Yasutake, Arai, Kazuo, Matsuda, Akihisa, Tanaka, Kazunobu

Journal:

Applied Physics Letters

Year:

1990

Language:

english

File:

PDF, 611 KB

english, 1990

34

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Deposition of Highly Crystallized Poly-Si Thin Films on Polymer Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure

Matsumoto, Mitsutaka, Suemitsu, Maki, Yara, Takuya, Setsuo, Nakajima, Tuyoshi, Uehara, Yasutake, Toyoshima, Syun, Itou

Year:

2006

Language:

english

File:

PDF, 477 KB

english, 2006

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